The above described nanotechnology processes need to be controlled for surface integrity and dimensional accuracy, which constitutes the field of nanometrology. Atomic force microscopy is the latest device developed for that reason but laser and X-ray interferometers are also used in nanometrology.

A specific area of nanometrology is the form measurement, e.g. the roundness or the flatness of the machined workpiece. This kind of metrology is very demanding and difficult to achieve, because there are many sources of uncertainty involved, especially in large-scale structures, like astronomical mirrors, where the measuring of roughness, dimensions and shape is essential for the functionality of the structure.